DOI 10.17586/0021-3454-2021-64-6-469-476
UDC 681.7.068.4
TECHNOLOGICAL METHODS FOR REDUCING THE GROWTH FACTORS OF SURFACE DEFECTS IN POLYMER PLANAR OPTICAL WAVEGUIDES
JSC Avangard, Microsystems Engineering Center; Process Engineer; St. Petersburg Electrotechnical University, Department of Photonics;
I. A. Lamkin
PhD, Associate Professor; St. Petersburg Electrotechnical University, Department of Photonics;
S. A. Tarasov
Dr. Sci., Associate Professor; St. Petersburg Electrotechnical University, Department of Science; Director; Department of Photonics; Head of the Department;
N. N. Ivanov
Dr. Sci.; The Bonch-Bruevich St. Petersburg State University of Telecommunications, Institute of Magistracy; Deputy Director for Research;
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Abstract. Several technological approaches to reduction of surface defects in polymer planar optical waveguides are presented. Experimental studies are shown to reveal and eliminate the factors contributing to an increase in the number of surface defects when using soft lithography technology. The efficiency of using a specially designed light filter is demonstrated.
Keywords: polymer planar optical waveguides, soft lithography, master stamp, PDMS, SU-8, negative tilt of the photoresist walls, scattering losses
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