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vol 64 / October, 2021
Article

DOI 10.17586/0021-3454-2016-59-2-159-163

UDC 681.7.02

SELECTION CRITERIA FOR TECHNOLOGY OF OPTICAL SURFACE FORMATION FOR SUBMILLIMETER WAVELENGTH LENS

D. G. Makarova
Siberian State Academy of Geodesy, Department of Nanosystems and Optical Devices, Novosibirsk; Post-Graduate Student


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Abstract. The possibility to optimize lens optical surface formation for submillimeter spectrum is considered. The presented analysis is based on image quality criteria and takes into account the manufacturing tolerances (dimensional tolerance, form tolerance, position tolerance, allowable roughness) and the labor costs for materials transparent in the submillimetre range (polyethylene, crystal quartz, polyethylene terephthalate, α –saphire, silicon).
Keywords: technology, forming, submillimeter, dimensional tolerance, form tolerance, position tolerances, tolerance to roughness, labor costs

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