ISSN 0021-3454 (print version)
ISSN 2500-0381 (online version)
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12
Issue
vol 59 / DECEMBER, 2016
Article
UDC [535.621.375.8]:539

FORMATION OF SIO2/SI SYSTEM MORPHOLOGY UNDER THE ACTION OF EXCIMER LASER RADIATION

C. T. Huynh
Quy Nhon University, Quy Nhon, Binh Dinh, 170 An Duong Vuong, Viet Nam, ; lecturer


A. M. Skvortsov
ITMO University, 197101, Saint Petersburg, Russian Federation; Professor


A. A. Petrov
ITMO University, 197101, Saint-Petersburg, Russian Federation; Associate professor


Abstract. Formation of micro-and nano-scale periodic structures on the surface of SiO2/Si system with the use of nanosecond laser pulses is investigated. Exposure of experimental samples to ultraviolet ArF laser pulse (193 nm) is shown to produce periodic wave-like structures on the surface. The dependence of the surface topology of SiO2/Si system on the laser pulse energy density and on the number of pulses is studied.
Keywords: nanosecond laser, nanostructuring, periodic structures, SiO2/Si system, optical microscopy, probe microscopy