ISSN 0021-3454 (print version)
ISSN 2500-0381 (online version)
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Author
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Maksim A. Korobkov

Work place: Moscow Aviation Institute, Department of Digita Technologies and Information Systems
Post: Senior Lecturer
E-mail: josef_turok@bk.ru
Maksim A. Korobkov, Artem S. Demidov, Olga V. Khomutskaya METHOD OF PHOTOMASK AND BLANK ALIGNMENT FOR DIRECT EXPOSURE OF PCB BASED ON A LIQUID CRYSTAL MATRIX
The article was published in issue4(68) за 2025