Abstract. Application of the method of processing of transparent materials with laser-induced microplasma to create a multilevel phase plate on fused quartz surface is demonstrated. Optimization of the method for the existing laser system "Minimarker 2" based on Yb-fiber laser with a nanosecond pulse duration (50-200 NS) is described. A software is developed which allows to link parameters of laser treatment with deep relief microstructures, as well as to generate a multilevel phase plate in automatic mode. Based on the results, samples of layered phase plates with binary and discrete structure for testing with He-Ne laser setup are recorded. Comparative analysis of binary and discrete phase plates applied as homogenizers of He-Ne laser radiation is carried out. It is shown that a more uniform distribution of intensity in the beam cross-section is achieved by using discrete phase plate. The proposed method of laser writing of diffractive elements is reported to allow manufacturing of phase plates with a relief depth from 0.1 to 15.0 μm with a step of 50 nm and the minimum size of the cells of 200 μm.

Keywords: plasma, fused silica, phase plate, homogenization, laser micro-processing

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