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vol 63 / July, 2020
Article

DOI 10.17586/0021-3454-2019-62-8-758-762

UDC 532.62:547.27

DEPENDENCE OF THE REFRACTIVE AND ABSORPTION INDICES ON NANOSCALE LIQUID FILM THICKNESS

N. V. Novozhilov
Tver State University;


N. Y. Sdobnyakov
Tver State University;


I. D. Rodin
Tver State University;


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Abstract. Based on the spectrum analysis of the ellipsometry angles obtained with photometric spectral ellipsometer «El`f», an investigation of size dependences for the refractive index and absorption index of nanosized ethanol film deposited on a silicon substrate and a glass substrate is performed. The refractive index is found to decrease monotonically with the film thickness in the thickness range under investigation. In the region of 85–140 nm for the glass substrate and 120–150 nm for the silicon substrate, a rather sharp decrease in the absorption coefficient was observed with a decrease in the film thickness. It is assumed that for the refractive index such an effect occurs only in the range of smaller film thicknesses.
Keywords: refractive index and absorption index, size dependence, ellipsometry, nanosized liquid film

References:
  1. Peiponen K.-E. Optical spectra analysis of turbid liquids Faculty of Technology, Department of Electrical and Information Engineering, Oulu, University of Oulu, 2009, 60 p.
  2. Henkel S., Beyrau F., Hardalupas Y., Taylor A.M.K.P. Optics Express, 2016, no. 3(16), pp. 2542–2561. DOI:10.1364/OE.24.002542.
  3. Weir K., Yupapin P.V.P., Chitaree R., Palmer A.W., Grattan K.T.V. Sensors and Actuators A: Physical, 1998, no. 1(65), pp. 19–22. DOI: 10.1016/S0924-4247(97)01642-7.
  4. Webster R.D., Beaglehole D. Physical Chemistry Chemical Physics, 2000, vol. 2, рр. 5660–5666. DOI: 10.1039/B005629O.
  5. Hirtz A., Findenegg G.H. Journal of Physics: Condensed Matter, 1996, Vol. 8, рp. 9541–9545. DOI: 10.1088/0953-8984/8/47/059.
  6. Kim D.A., Sdobnyakov N.Yu., Novozhilov N.V., Antonov A.S., Sokolov D.N., Voronova E.A. Nanotekhni-ka, 2013, no. 2(34), pp. 72–74.
  7. Lyubinskaya R.I., Mardezhov A.S., Svitashev K.K., Khasanov T. Optics and Spectroscopy, 1988, no. 3(65), pp. 632–636. (in Russ.)
  8. Novozhilov N.V., Sdobnyakov N.Yu., Rodin I.D. Fiziko-khimicheskiye aspekty izucheniya klasterov, nanostruktur i nanomaterialov (Physico-Chemical Aspects of the Study of Clusters, Nanostructures and Nanomaterials), 2016, no. 8, pp. 269–272. (in Russ.)
  9. Shirshov Yu.M., Nabok A.V., Dotsenko A.M. Issledovaniye profilya pokazatelya prelomleniya neodnorod-nykh dielektricheskikh sloev metodom posloynogo travleniya In: Ellipsometriya – metod issledovaniya poverkhnosti (Ellipsometry is a Surface Research Method), Novosibirsk, 1983, рр. 100–102.
  10. Mutilin S.V., Khasanov T. Optics and Spectroscopy, 2008, no. 3(105), pp. 461–465.
  11. Churayeva M.N., Zorin Z.M., Konyushkina N.I. Opredeleniye opticheskikh kharakteristik tolstykh slabo-pogloshchayushchikh plenok metodom spektral'noy ellipsometrii In: Ellipsometriya: teoriya, metody, prilozheniya (Ellipsometry: Theory, Methods, Applications), Novosibirsk, 1991, рр. 67–72.
  12. Grigor'yeva T.I., Ziling K.K., Mardezhov A.S., Khasanov T. Ellipsometricheskoye opredeleniye tolshchiny titana dlya tseley volnovodnoy optiki (Ellipsometric Determination of Titanium Thickness for Waveguide Optics Circuits), Preprint 3-85, Novosibirsk, 1985, 10 р. (in Russ.)
  13. Sdobnyakov N.Yu., Novozhilov N.V., Antonov A.S., Voronova E.A., Mikhaylova O.V. Fiziko-khimicheskiye aspekty izucheniya klasterov, nanostruktur i nanomaterialov (Physico-Chemical Aspects of the Study of Clusters, Nanostructures and Nanomaterials), 2014, no. 6, pp. 349–352. (in Russ.)
  14. Samsonov V.M., Sdobnyakov N.Yu. Bembel A.G., Sokolov D.N., Novozhilov N.V. Journal of Nano- and Electronic Physics, 2013, no. 4(5), pp. 04005-1–04005-3.
  15. Boynovich L.B., Emel'yanenko A.M. Primeneniye ellipsometrii svobodnykh plenok dlya opredeleniya pokazateley prelomleniya subtonkikh sloyev zhidkosti In: Ellipsometriya: teoriya, metody, prilozheniya (Ellipsometry: Theory, Methods, Applications), Novosibirsk, 1991, рр. 61–66. (in Russ.)