ISSN 0021-3454 (print version)
ISSN 2500-0381 (online version)
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9
Issue
vol 60 / SEPTEMBER, 2017
Article
UDC 547.97:535.8; 541.147

APPLICATION OF NANOIMPRINT LITHOGRAPHY TO MANUFACTURE NANO- AND MICROELEMENTS IN PHOTONICS

Арефьева Н. Н.
Университет ИТМО; научный сотрудник


I. Y. Denisyuk
ITMO University, Saint Petersburg, 197101, Russian Federation; Department head


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Abstract. Manufacturing of polymer micro-optical elements by contact duplication with the use of flexible stamp is considered. The effect of shrinkage of UV-hardened composition on duplication accuracy is studied experimentally. Possibility of nano-sized structure duplication with existing equipment is confirmed by experiment with 1800 Grooves/mm diffraction grating.
Keywords: nanoimprint, contact lithography, nanostructure, photopolymer, siloxane.