APPLICATION OF COMPUTER ISOPHOTOMETRY FOR CHECKING OF OBJECTIVE FOR NANOLITHOGRAPHY
State Educational Establishment of High Professional Education “Saint-Petersburg State University of Information Technologies, Mechanics and Optics”; Professor
Y. . Gavrilov
ITMO University; Postgraduate
P. A. Zhevlakov
Institute of Laser Physics, S. I. Vavilov State Optical Institute;
Abstract. Quality control of optical surface finishing for modern Schwarzschild reflecting objectives operating in the EUV spectral range is shown to call for direct photometry of image structure. The method of isophotometry of point test object image allows to overcome restrictions caused by insufficient sensitivity of diffraction interferometry.
Keywords: nanolithography, reflecting objective, interferometry, computer isophotometry.